[News] Japan Develops 10nm Nanoimprint Technology, with Potential to Tackle EUV Bottleneck
- Posted on December 25, 2025
- By Google News
- 9 Views
[News] Japan Develops 10nm Nanoimprint Technology, with Potential to Tackle EUV Bottleneck
Japan’s Dai Nippon Printing (DNP) recently announced the successful development of nanoimprint lithography (NIL) technology with circuit line width as...
